Proceedings of the International Symposium on Dry Process - DPS 2006STAMATE, E; ONO, K; SHIRATANI, M et al.Thin solid films. 2008, Vol 516, Num 11, issn 0040-6090, 268 p.Conference Proceedings

Characterization of electron irradiated GaN n⁺-p diodeDONG UK LEE; EUN KYU KIM; BYUNG CHEOL LEE et al.Thin solid films. 2008, Vol 516, Num 11, pp 3482-3485, issn 0040-6090, 4 p.Conference Paper

Crystallization of amorphous Ge films induced by semiconductor diode laser annealingSAKAIKE, K; HIGASHI, S; MURAKAMI, H et al.Thin solid films. 2008, Vol 516, Num 11, pp 3595-3600, issn 0040-6090, 6 p.Conference Paper

Plasma ash processing solutions for advanced interconnect technologyFULLER, N. C. M; WORSLEY, M. A; TAI, L et al.Thin solid films. 2008, Vol 516, Num 11, pp 3558-3563, issn 0040-6090, 6 p.Conference Paper

Characteristics of monopole antenna plasmas for TEOS PECVDTAKIZAWA, K; MORI, Y; MIYATAKE, N et al.Thin solid films. 2008, Vol 516, Num 11, pp 3605-3609, issn 0040-6090, 5 p.Conference Paper

Deposition of polycrystalline SiGe by surface wave excited plasmaTAKANISHI, Y; OKAYASU, T; TOYODA, H et al.Thin solid films. 2008, Vol 516, Num 11, pp 3554-3557, issn 0040-6090, 4 p.Conference Paper

Investigation of reduction in etch rate of isolated holes in SiOCHMOMONOI, Yoshinori; YONEKURA, Kazumasa; IZAWA, Masaru et al.Thin solid films. 2008, Vol 516, Num 11, pp 3564-3567, issn 0040-6090, 4 p.Conference Paper

Application of PVD coatings for developing a DSA-type anodeSANG SIK KIM; SUNG DAE KIM.Thin solid films. 2008, Vol 516, Num 11, pp 3673-3679, issn 0040-6090, 7 p.Conference Paper

Fabrication of thin-film thermopile micro-bridge with XeF₂ etching processYOO, Kum-Pyo; MIN, Nam-Ki.Thin solid films. 2008, Vol 516, Num 11, pp 3586-3589, issn 0040-6090, 4 p.Conference Paper

Improvement of emission reliability of carbon nanotube emitters by electrical conditioningPARK, J. H; JEON, S. Y; ALEGAONKAR, P. S et al.Thin solid films. 2008, Vol 516, Num 11, pp 3618-3621, issn 0040-6090, 4 p.Conference Paper

Microstructure and mechanical properties of TiZrAlN nanocomposite thin films by CFUBMSKIM, Youn J; LEE, Ho Y; BYUN, Tae J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3651-3655, issn 0040-6090, 5 p.Conference Paper

Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmasMATSUKUMA, Masaaki; HAMAGUCHI, Satoshi.Thin solid films. 2008, Vol 516, Num 11, pp 3443-3448, issn 0040-6090, 6 p.Conference Paper

Challenges in etch : What's new?GONSCHO, Richard A; NOJIRI, K; LACARA, J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3493-3496, issn 0040-6090, 4 p.Conference Paper

Development of split gliding arc for surface treatment of conductive materialSHIKI, Hajime; MOTOKI, Junpei; SAKAKIBARA, Tateki et al.Thin solid films. 2008, Vol 516, Num 11, pp 3684-3689, issn 0040-6090, 6 p.Conference Paper

Impact of line width roughness on the matching performances of next-generation devicesGUSTIN, C; LEUNISSEN, L. H. A; MERCHA, A et al.Thin solid films. 2008, Vol 516, Num 11, pp 3690-3696, issn 0040-6090, 7 p.Conference Paper

Multi-barrier layer-mediated growth of carbon nanotubesLEE, H. C; ALEGAONKAR, P. S; KIM, D. Y et al.Thin solid films. 2008, Vol 516, Num 11, pp 3646-3650, issn 0040-6090, 5 p.Conference Paper

Selective deposition of catalyst nanoparticles using the gravitational force for carbon nanotubes interconnectKIM, Do-Yoon; LEE, Hyun-Chul; KWON, Kee-Won et al.Thin solid films. 2008, Vol 516, Num 11, pp 3534-3537, issn 0040-6090, 4 p.Conference Paper

Synthesis and characterization of crystalline β-Bi₂O₃ nanobeltsHYOUN WOO KIM.Thin solid films. 2008, Vol 516, Num 11, pp 3665-3668, issn 0040-6090, 4 p.Conference Paper

Prediction of etching results and etching stabilization by applying principal component regression to emission spectra during in-situ cleaningIWAKOSHI, Takehisa; HIROTA, Kosa; MORI, Masahito et al.Thin solid films. 2008, Vol 516, Num 11, pp 3464-3468, issn 0040-6090, 5 p.Conference Paper

Single dopant white electrophosphorescent light emitting diodes using heteroleptic tris-cyclometalated Iridium(III) complexesJI HYUN SEA; IN JOON KIM; YOUNG KWAN KIM et al.Thin solid films. 2008, Vol 516, Num 11, pp 3614-3617, issn 0040-6090, 4 p.Conference Paper

Synthesis and photo physical study of iridium complex of new pentafluorophenyl-substituted ligandsGUI YOUN PARK; JI HYUN SEO; YOUNG KWAN KIM et al.Thin solid films. 2008, Vol 516, Num 11, pp 3622-3626, issn 0040-6090, 5 p.Conference Paper

Control of electrical resistivity of TaN thin films by reactive sputtering for embedded passive resistorsKANG, S. M; YOON, S. G; SUH, S. J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3568-3571, issn 0040-6090, 4 p.Conference Paper

Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasmaSU RYUN MIN; HAN NA CHO; YUE LONG LI et al.Thin solid films. 2008, Vol 516, Num 11, pp 3521-3529, issn 0040-6090, 9 p.Conference Paper

Time-resolved optical emission spectroscopy of pulsed RF plasmas with copper magnetron sputteringKANG, Namjun; PARK, Junghoon; OH, Soo-Ghee et al.Thin solid films. 2008, Vol 516, Num 11, pp 3460-3463, issn 0040-6090, 4 p.Conference Paper

Chemical and structural modifications in a 193-nm photoresist after low-k dry etchKESTERS, E; CLAES, M; BIEBUYK, J. J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3454-3459, issn 0040-6090, 6 p.Conference Paper